Karl Fischer & Potentiometric Titration Application Library
Fractional Determination of Hydrofluoric Acid and Nitric Acid for Semiconductor Process Control
Precise control of hydrofluoric acid (HF) and nitric acid (HNO3) concentrations is essential for semiconductor wet-process chemistry and advanced surface treatment applications. Learn how the Hiranuma COM-A19 automatic potentiometric titrator provides accurate fractional acid determination for demanding industrial laboratories.
Fractional Determination of Hydrofluoric Acid and Hydrochloric Acid for Surface Treatment Processes
Automated potentiometric titration for precise determination of hydrofluoric acid (HF) and hydrochloric acid (HCl) in semiconductor and surface-treatment process applications using the Hiranuma COM-A19 titrator.
Determination of alkaline component in photoresist remover solution (Determination of carbonates with barium chloride addition method) | Autotitrator COM-A19
Strong alkaline solution is used as remover for residual photoresist on the substrate after the development of the substrate for liquid crystal display instrument etc. The composition depends on the intended use but sodium hydroxide, potassium hydroxide, and tetramethylammonium hydroxide (TMAH) are used as remover.
TMAH can be determined by potentiometric titration with hydrochloric acid standard solution. TMAH could absorb carbon dioxide gas and generate carbonates, it indicates another inflection point at pH around 4 on the titration with hydrochloric acid standard solution. This report introduces an example of fractional determination for TMAH and carbonates.
Determination of alkaline component in photoresist remover solution | Autotitrator COM-A19
Strong alkaline solution is used as remover for residual photoresist on the substrate after the development of the substrate for liquid crystal display instrument etc. The composition depends on the intended use but sodium hydroxide, potassium hydroxide, and tetramethylammonium hydroxide (TMAH) are used as remover.
TMAH can be determined by potentiometric titration with hydrochloric acid standard solution. TMAH could absorb carbon dioxide gas and generate carbonates, it indicates another inflection point at pH around 4 on the titration with hydrochloric acid standard solution. This report introduces an example of fractional determination for TMAH and carbonates.
