Analytical Applications and Methods
Fractional Determination of Hydrofluoric Acid and Nitric Acid for Semiconductor Process Control
Precise control of hydrofluoric acid (HF) and nitric acid (HNO3) concentrations is essential for semiconductor wet-process chemistry and advanced surface treatment applications. Learn how the Hiranuma COM-A19 automatic potentiometric titrator provides accurate fractional acid determination for demanding industrial laboratories.
Fractional Determination of Hydrofluoric Acid and Hydrochloric Acid for Surface Treatment Processes
Automated potentiometric titration for precise determination of hydrofluoric acid (HF) and hydrochloric acid (HCl) in semiconductor and surface-treatment process applications using the Hiranuma COM-A19 titrator.
Acid and Total Acid Control in Phosphate Baths Using Potentiometric Titration
Accurate control of free acid and total acid is essential for consistent phosphate coating performance. Learn how automated titration improves repeatability and process control.
Chloride Determination in Plating Baths Using Silver Nitrate Titration
Accurate chloride determination is essential for maintaining plating bath performance and coating quality. Learn how automated silver nitrate titration improves consistency and reduces operator variability.
Determination of Alkaline Component in Photoresist Remover – COM-A19 Titrator |JM Science
"This application note shows how the COM-A19 Automatic Titrator measures TMAH and carbonates in photoresist remover solutions, providing accurate and reliable results for semiconductor manufacturing processes."
Fractional Determination of Acetic Acid and Ammonium Acetate Using Automated Titration
Simultaneous determination of acetic acid and ammonium acetate using automated titration. Improve process control in semiconductor and industrial applications.
Boric Acid Analysis in Nickel Plating Baths Using Potentiometric Titration
Boric acid is a critical buffer in nickel plating baths. Learn how automated potentiometric titration with mannitol improves accuracy, repeatability, and process control.
Copper Analysis in Copper Sulfate Plating Baths Using Redox Titration
Copper concentration is critical to plating performance and coating quality. Learn how automated redox titration improves accuracy, repeatability, and process control in copper sulfate baths.
Nickel (Ni²⁺) Analysis in Nickel Plating Baths Using EDTA Titration
Nickel concentration is the most critical parameter in plating bath control. Learn how automated EDTA titration improves accuracy, repeatability, and coating consistency.
Determination of Tin (Sn²⁺) in solder plating solution | Autotitrator COM-A19
Control active tin (Sn²⁺) levels in solder plating baths to improve coating quality and prevent oxidation-related process instability.
Chromium (Cr⁶⁺ and Cr³⁺) Analysis in Plating Baths for Process and Environmental Control
Control hexavalent and trivalent chromium levels in plating baths to improve coating performance, reduce defects, and support environmental compliance.
Nickel Chloride Analysis in Nickel Plating Baths for Process Control
Nickel chloride plays a critical role in plating bath conductivity and anode performance. Learn how accurate analysis improves process stability and coating quality.
